描述
| Manufacturer | Nextral |
| Model | NE 550 |
| Condition | Used/See Description |
| Lot Number | 20948-290 |
Key Technical Specifications:
Chamber & Cathode: Features a large 43 cm diameter cathode covered with a high-purity quartz plate.
Power System: 1200W RF Generator (13.56 MHz) with automatic impedance matching (Auto Load & Tune).
Anode: Located on the chamber lid (grounded) and serves as the reactive gas injection system.
Cooling System: Cathode and turbo pump are cooled via a dedicated chiller using specialized coolant (Galden type).
Vacuum System: * Turbo-molecular pump for high vacuum.
Primary backing pump integrated into the frame (utilizing Alcatel AL 300 oil).
Automatic pressure and gas regulation.
Advanced Features & Control:
End-Point Detection: Equipped with a Laser Diode (677.3 nm) for real-time etching depth monitoring and precise process termination.
Software Control: Operated via PC with NAPS software, allowing for full parameter management, recipe creation, and real-time process tracking on screen.
Condition & Logistics:
Status: Complete system with all integrated subsystems (chiller, pumps, control PC).
USED, IN GOOD VISUAL CONDITION, NOT TESTED.
Packing and preparation for shipment available upon request.
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