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Location:
Białogard, Zachodniopomorskie, POLRemoval & Shipping:
Buyer Must Arrange. See details.
Delivery:
Shipping Available | See details| Manufacturer | Nextral |
| Model | RIE NE 110 |
| Condition | Used/See Description |
| Lot Number | 20948-289 |
Process: Reactive Ion Etching (RIE) for high-precision plasma etching.
Chamber: Vacuum etching chamber with a maximum internal diameter of 15 cm.
Electrode Configuration: * Bottom Cathode: Powered by a high-performance 1200W RF Generator (13.56 MHz).
Top Anode: Functions as the gas injection system for reactive process gases.
Gas Distribution: Equipped with 5 Mass Flow Controllers (MFC) for precise gas ratio management.
Vacuum System: High-vacuum setup including:
Alcatel primary backing pump.
Turbo-molecular pump (integrated directly under the chamber for maximum conductance).
Power: Dedicated 13.56 MHz Radio Frequency generator.
USED, IN GOOD VISUAL CONDITION, NOT TESTED.
Packing and preparation for shipment available upon request.
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